ASML EXE 5000 Wilton, CT
Description
Design-build of a 30,000 sf Semiconductor Capital Equipment manufacturing building and cleanroom. The 26,000 sf, ISO 6 cleanroom had a 24-ft ceiling, 4-ft depressed slab, and raised access floor. HC handled all aspects of construction, including site work, stabilization with rock piles, foundations, steel, metal wall panels, and TPO roofing. The cleanroom featured walkable Power T 2″ grid, 4×4 fan filters, new units for cooling, chillers, and exhaust fans. HC installed a 10 MW power service, process cooling water, CDA, RO/DI piping, N2, LN2, and specialty gases, along with two 20-ton cleanroom bridge cranes. The project was completed 3 months ahead of schedule, within 16 months.
Industry
Microelectronics / Semiconductor
Project Delivery
Design Build
ISO Class
ISO 3, 4
Similar Projects
Massachusetts Institute of Technology Nano Fab Tool Installation
MIT contracted Hodess for the tool installation in their NANO fab in Cambridge, MA, completed in multiple phases. The Nano cleanroom is located in…