Our Work

ASML EXE 5000 Wilton, CT

Description

Design-build of a 30,000 sf Semiconductor Capital Equipment manufacturing building and cleanroom. The 26,000 sf, ISO 6 cleanroom had a 24-ft ceiling, 4-ft depressed slab, and raised access floor. HC handled all aspects of construction, including site work, stabilization with rock piles, foundations, steel, metal wall panels, and TPO roofing. The cleanroom featured walkable Power T 2″ grid, 4×4 fan filters, new units for cooling, chillers, and exhaust fans. HC installed a 10 MW power service, process cooling water, CDA, RO/DI piping, N2, LN2, and specialty gases, along with two 20-ton cleanroom bridge cranes. The project was completed 3 months ahead of schedule, within 16 months.

Industry

Microelectronics / Semiconductor

Project Delivery

Design Build

ISO Class

ISO 3, 4

Similar Projects

Massachusetts Institute of Technology Nano Fab Tool Installation

MIT contracted Hodess for the tool installation in their NANO fab in Cambridge, MA, completed in multiple phases. The Nano cleanroom is located in…

View Project
University of Virginia Nanotechnology Cleanroom

Hodess was hired as a design-builder under a special provision of Virginia’s purchasing rules to renovate 22,630 sf of cleanroom space in the basement…

View Project
Vanderbilt University Nanotechnology Cleanroom

A new cleanroom in the University’s Center for Nanotechnology includes 8,000 sf of ISO 5 (Class 100) and 4,000 sf of ISO 6 (Class…

View Project
You have questions. We have straight answers.