Description

A new cleanroom in the University’s Center for Nanotechnology includes 8,000 sf of ISO 5 (Class 100) and 4,000 sf of ISO 6 (Class 1000) cleanroom space. The project also featured hazardous gas storage rooms at the rear of the cleanroom and air chases along the building’s outside wall. The ceilings were flush gel seal with 100% ULPA filtration, contained in modular plenums to support recirculation air handling units in the cleanroom return air stream. The recirculation units were fan wall direct-drive units with sensible cooling coils. The cleanrooms are arranged in a chase bay configuration, with the E-Beam room acoustically isolated using sound-insulated panels. The facility includes Photolithography, Wet Etch, Dry Etch, Coating, Implantation, and device testing using SEMs in the sub-fab area.